EXPOSURE MODEL FOR ELECTRON-SENSITIVE RESISTS

被引：87

作者：

GREENEICH, JS

VANDUZER, T

机构：

[1] UNIV CALIF, DEPT ELECT ENGN & COMP SCI, BERKELEY, CA 94720 USA

[2] UNIV CALIF, ELECTR RES LABS, BERKELEY, CA 94720 USA

来源：

关键词：

D O I：

10.1109/T-ED.1974.17914

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：286 / 299

页数：14

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