SYNTHESIS OF X-RAY-INTENSITY PROFILES FOR X-RAY OPTICAL-SYSTEMS WITH CURVED DIFFRACTORS

被引：16

作者：

CHANG, WZ ^{[1
]}

WITTRY, DB ^{[1
]}

机构：

[1] UNIV SO CALIF,DEPT ELECT ENGN,LOS ANGELES,CA 90089

来源：

JOURNAL OF APPLIED PHYSICS | 1993年 / 74卷 / 05期

关键词：

D O I：

10.1063/1.354615

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A procedure for synthesizing the x-ray intensity profile for x-ray optical systems employing curved diffractors is presented. The synthesis takes account of the effects of misalignment, the solid angle, and the convergence or divergence of the diffracted x rays. Broadening effects due to finite source size, wavelength spread, and presence of polychromatic radiation have also been included. The broadening effects on the intensity profile are demonstrated analytically. By comparing experimental results with results from the synthesis method, curved diffractor's parameters (rocking curve width and peak reflectivity) were quantitatively evaluated for mica, silicon, graphite, and LiF crystals at three x-ray wavelengths.

引用

页码：2999 / 3008

页数：10

共 11 条

[1] SPECTRUM LINE PROFILES - VOIGT FUNCTION [J].