MULTIPLE STORAGE AND ERASURE OF FIXED HOLOGRAMS IN FE-DOPED LINBO3

被引：198

作者：

STAEBLER, DL ^{[1
]}

BURKE, WJ ^{[1
]}

PHILLIPS, W ^{[1
]}

AMODEI, JJ ^{[1
]}

机构：

[1] RCA LABS,PRINCETON,NJ 08540

来源：

APPLIED PHYSICS LETTERS | 1975年 / 26卷 / 04期

关键词：

D O I：

10.1063/1.88108

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：182 / 184

页数：3

共 17 条

[1]

Amodei J. J., 1971, RCA Review, V32, P185

[2] HOLOGRAPHIC PATTERN FIXING IN ELECTRO-OPTIC CRYSTALS [J].

AMODEI, JJ ;

STAEBLER, DL .

APPLIED PHYSICS LETTERS, 1971, 18 (12) :540-&

[3]

AMODEI JJ, 1971, IEEE J QUANTUM ELECT, VQE 7, P63

[4] HOLOGRAPHIC STORAGE IN LITHIUM NIOBATE [J].

CHEN, FS ;

LAMACCHIA, JT ;

FRASER, DB .

APPLIED PHYSICS LETTERS, 1968, 13 (07) :223-+

[5] OPTICALLY INDUCED CHANGE OF REFRACTIVE INDICES IN LINBO3 AND LITAO3 [J].

CHEN, FS .

JOURNAL OF APPLIED PHYSICS, 1969, 40 (08) :3389-&

[6] ELECTRONIC-STRUCTURE AND OPTICAL INDEX DAMAGE OF IRON-DOPED LITHIUM-NIOBATE [J].

CLARK, MG ;

DISALVO, FJ ;

GLASS, AM ;

PETERSON, GE .

JOURNAL OF CHEMICAL PHYSICS, 1973, 59 (12) :6209-6219

[7] ANGULAR SELECTIVITY OF LITHIUM-NIOBATE VOLUME HOLOGRAMS [J].

GAYLORD, TK ;

TITTEL, FK .

JOURNAL OF APPLIED PHYSICS, 1973, 44 (10) :4771-4773

[8] HIGH-VOLTAGE BULK PHOTOVOLTAIC EFFECT AND THE PHOTOREFRACTIVE PROCESS IN LINBO3 [J].

GLASS, AM ;

LINDE, DVD ;

NEGRAN, TJ .

APPLIED PHYSICS LETTERS, 1974, 25 (04) :233-235

[9] COUPLED WAVE THEORY FOR THICK HOLOGRAM GRATINGS [J].

KOGELNIK, H .

BELL SYSTEM TECHNICAL JOURNAL, 1969, 48 (09) :2909-+

[10] CONTROL OF SUSCEPTIBILITY OF LITHIUM NIOBATE TO LASER-INDUCED REFRACTIVE INDEX CHANGES [J].

PETERSON, GE ;

GLASS, AM ;

NEGRAN, TJ .

APPLIED PHYSICS LETTERS, 1971, 19 (05) :130-&

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