HILLOCKS AS STRUCTURAL MARKERS FOR ELECTROMIGRATION RATE MEASUREMENTS IN THIN FILMS

被引：28

作者：

HOWARD, JK

ROSS, RF

机构：

来源：

APPLIED PHYSICS LETTERS | 1971年 / 18卷 / 08期

关键词：

D O I：

10.1063/1.1653690

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：344 / &

共 17 条

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[2]

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MEIERAN, ES .

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[4] DIRECT TRANSMISSION ELECTRON MICROSCOPE OBSERVATION OF ELECTROTRANSPORT IN ALUMINUM THIN FILMS [J].

BLECH, IA ;

MEIERAN, ES .

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[5]

CHHABRA D, 1967, ELECTROCHEMICAL SOCI

[6]

DASILVA LCC, 1951, T AM I MIN MET ENG, V191, P155

[7] NMR MEASUREMENT OF DIFFUSION COEFFICIENT OF PURE ALUMINUM [J].

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ROWLAND, TJ .

APPLIED PHYSICS LETTERS, 1967, 11 (06) :207-&

[8] SOME OBSERVATIONS ON ELECTROMIGRATION IN ALUMINUM FILMS [J].

GHATE, PB .

APPLIED PHYSICS LETTERS, 1967, 11 (01) :14-&

[9]

Hansen M., 1958, J ELECTROCHEM SOC, DOI DOI 10.1149/1.2428700

[10] ELECTROMIGRATION EFFECTS IN ALUMINUM FILM ON SILICON SUBSTRATES [J].

HOWARD, JK ;

ROSS, RF .

APPLIED PHYSICS LETTERS, 1967, 11 (03) :85-&

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