OVERLAYER INTERACTIONS WITH (HGCD)TE

被引：24

作者：

DAVIS, GD

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575210

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1939 / 1945

页数：7

共 37 条

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JOURNAL OF APPLIED PHYSICS, 1986, 60 (09) :3150-3156

[10] INTERACTIONS BETWEEN CLEAVED (HG, CD)TE SURFACES AND DEPOSITED OVERLAYERS OF AL AND INDIUM [J].

DAVIS, GD ;

BYER, NE ;

RIEDEL, RA ;

MARGARITONDO, G .

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