HEAT TREATMENT OF SILICON USING ZONE HEATING TECHNIQUES

被引:19
作者
THEUERER, HC
WHELAN, JM
BRIDGERS, HE
BUEHLER, E
机构
关键词
D O I
10.1149/1.2428462
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:721 / 723
页数:3
相关论文
共 5 条
[1]  
FULLER, 1954, PHYS REV, V93, P1182
[2]   RESISTIVITY CHANGES IN SILICON SINGLE CRYSTALS INDUCED BY HEAT TREATMENT [J].
FULLER, CS ;
DITZENBERGER, JA ;
HANNAY, NB ;
BUEHLER, E .
ACTA METALLURGICA, 1955, 3 (01) :97-99
[3]   CRYSTALLIZATION OF SILICON FROM A FLOATING LIQUID ZONE [J].
KECK, PH ;
GOLAY, MJE .
PHYSICAL REVIEW, 1953, 89 (06) :1297-1297
[4]   SOLUBILITY AND DIFFUSIVITY OF GOLD, IRON, AND COPPER IN SILICON [J].
STRUTHERS, JD .
JOURNAL OF APPLIED PHYSICS, 1956, 27 (12) :1560-1560
[5]  
Theurer H.C., 1956, J MET, V8, P1316