PREPARATION OF WATER-SOLUBLE PHOTORESIST DERIVED FROM POLYVINYL-ALCOHOL)

被引：60

作者：

ICHIMURA, K

机构：

来源：

JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY | 1982年 / 20卷 / 06期

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D O I：

10.1002/pol.1982.170200604

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

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页码：1411 / 1417

页数：7

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[3] PREPARATION AND CHARACTERISTICS OF PHOTOCROSSLINKABLE POLYVINYL-ALCOHOL)
ICHIMURA, K
WATANABE, S
[J]. JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1982, 20 (06) : 1419 - 1432
[4] HIGHLY PHOTOSENSITIVE POLYMERS WITH ANOMALOUSLY LOW CONTENT OF STILBAZOLIUM GROUPS
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WATANABE, S
[J]. JOURNAL OF POLYMER SCIENCE PART C-POLYMER LETTERS, 1980, 18 (09) : 613 - 617
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