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CURRENT CONTROLLED NEGATIVE-RESISTANCE AND MEMORY SWITCHING EFFECT OF METAL BISMUTH OXIDE-METAL THIN-FILMS
被引:6
作者
:
KOMORITA, K
论文数:
0
引用数:
0
h-index:
0
机构:
SAGA UNIV,FAC SCI & ENGN,DEPT ELECT ENGN,SAGA 840,JAPAN
KOMORITA, K
SUZUKI, M
论文数:
0
引用数:
0
h-index:
0
机构:
SAGA UNIV,FAC SCI & ENGN,DEPT ELECT ENGN,SAGA 840,JAPAN
SUZUKI, M
机构
:
[1]
SAGA UNIV,FAC SCI & ENGN,DEPT ELECT ENGN,SAGA 840,JAPAN
[2]
SAGA UNIV,FAC SCI & ENGN,DEPT PHYS,SAGA 840,JAPAN
来源
:
JAPANESE JOURNAL OF APPLIED PHYSICS
|
1975年
/ 14卷
/ 06期
关键词
:
D O I
:
10.1143/JJAP.14.913
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:913 / 914
页数:2
相关论文
共 3 条
[1]
AVALANCHE-INDUCED NEGATIVE RESISTANCE IN THIN OXIDE FILMS
CHOPRA, KL
论文数:
0
引用数:
0
h-index:
0
CHOPRA, KL
[J].
JOURNAL OF APPLIED PHYSICS,
1965,
36
(01)
: 184
-
&
[2]
CHOPRA KL, 1963, P IEEE, V51, P491
[3]
BISTABLE SWITCHING IN NIOBIUM OXIDE DIODES
HIATT, WR
论文数:
0
引用数:
0
h-index:
0
HIATT, WR
HICKMOTT, TW
论文数:
0
引用数:
0
h-index:
0
HICKMOTT, TW
[J].
APPLIED PHYSICS LETTERS,
1965,
6
(06)
: 106
-
&
←
1
→
共 3 条
[1]
AVALANCHE-INDUCED NEGATIVE RESISTANCE IN THIN OXIDE FILMS
CHOPRA, KL
论文数:
0
引用数:
0
h-index:
0
CHOPRA, KL
[J].
JOURNAL OF APPLIED PHYSICS,
1965,
36
(01)
: 184
-
&
[2]
CHOPRA KL, 1963, P IEEE, V51, P491
[3]
BISTABLE SWITCHING IN NIOBIUM OXIDE DIODES
HIATT, WR
论文数:
0
引用数:
0
h-index:
0
HIATT, WR
HICKMOTT, TW
论文数:
0
引用数:
0
h-index:
0
HICKMOTT, TW
[J].
APPLIED PHYSICS LETTERS,
1965,
6
(06)
: 106
-
&
←
1
→