FLOW-INJECTION ANALYSIS OF HIGH CHLORIDE LEVELS IN ELECTROPLATING BATHS USING ONLINE DIALYSIS AND POTENTIOMETRIC DETECTION

被引:15
作者
ARAUJO, AN
ETXEBARRIA, MB
LIMA, JLFC
MONTENEGRO, MCBSM
OLMOS, RP
机构
[1] FAC FARM PORTO,DEPT QUIM FIS,CEQUP,P-4000 OPORTO,PORTUGAL
[2] ESCUELA UNIV INGN TECN IND,DEPT QUIM ANALIT,E-48012 BILBAO,SPAIN
来源
FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY | 1995年 / 351卷 / 07期
关键词
D O I
10.1007/BF00323335
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
A method for the flow injection analysis (FIA) of high concentrations of chloride in electroplating baths using potentiometric detection is proposed. The system includes a unit of dialysis to promote dilution of samples and a tubular electrode with an homogeneous crystalline membrane as detector. The system was optimized in order to analyse samples within a broad range of concentrations and at high levels of chloride, thereby making pretreatment of the samples unnecessary. It results in a simple manifold applicable over the 4.0 x 10(-2) and 3.0 mol L(-1) range with a throughput of about 30 samples/h. Seven different plating bath samples were analysed by the proposed method and the quality of the results compared with those obtained by the conventional procedure. Satisfactory agreement was observed.
引用
收藏
页码:614 / 617
页数:4
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