PULSED ELECTRODEPOSITION OF COPPER/NICKEL MULTILAYERS ON A ROTATING-DISK ELECTRODE .2. POTENTIOSTATIC DEPOSITION

被引：23

作者：

YANG, CC

CHEH, HY

机构：

[1] Department of Chemical Engineering and Applied Chemistry, Columbia University, New York

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1995年 / 142卷 / 09期

关键词：

Boundary conditions - Copper - Current density - Diffusion - Electrolysis - Mathematical models - Multilayers - Nickel;

D O I：

10.1149/1.2048682

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Thin Cu/Ni multilayers were deposited on a rotating disk electrode (RDE) by square-wave potentiostatic pulses. A theoretical model was developed to predict the copper content in the Ni layer on the RDE. The copper content in the Ni layer was measured under a variety of experimental conditions. Theory agrees well with experimental results.

引用

页码：3040 / 3043

页数：4

共 5 条

[1] MAGNETIC-PROPERTIES OF ELECTRODEPOSITED COPPER-NICKEL COMPOSITION-MODULATED ALLOYS [J].