DIFFUSE X-RAY-SCATTERING FROM SMALL DEFECTS IN A VERY PERFECT SILICON SINGLE-CRYSTAL

被引：9

作者：

HARADA, J ^{[1
]}

WAKAMATSU, K ^{[1
]}

YASUAMI, S ^{[1
]}

机构：

[1] TOSHIBA RES & DEV CTR,1 KOMUKAI TOSHIBACHO,SAIWAIKU,KAWASAKI 210,JAPAN

来源：

APPLIED PHYSICS LETTERS | 1978年 / 32卷 / 05期

关键词：

D O I：

10.1063/1.90044

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：271 / 272

页数：2

共 12 条

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[7] X-RAY-DIFFRACTION STUDY OF SHORT-RANGE-ORDER DIFFUSE-SCATTERING FROM DISORDERED CU 29.8 AT PERCENT PD ALLOY [J].

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HARADA, J .

ACTA CRYSTALLOGRAPHICA SECTION A, 1976, 32 (SEP1) :883-892

[8] X-RAY DIFFUSE-SCATTERING FROM SILICON CONTAINING OXYGEN CLUSTERS [J].

PATEL, JR .

JOURNAL OF APPLIED CRYSTALLOGRAPHY, 1975, 8 (APR1) :186-191

[9] X-RAY ANOMALOUS TRANSMISSION AND TOPOGRAPHY OF IMPURITY CLUSTERING IN PERFECT CRYSTALS [J].

PATEL, JR .

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[10]

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