DEEP LEVELS IN MOCVD GAAS GROWN UNDER DIFFERENT GA-AS MOL FRACTIONS

被引:41
作者
ZHU, HZ
ADACHI, Y
IKOMA, T
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关键词
D O I
10.1016/0022-0248(81)90283-9
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
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页码:154 / 163
页数:10
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共 14 条
[1]   TREND OF DEEP STATES IN ORGANOMETALLIC VAPOR-PHASE EPITAXIAL GAAS WITH VARYING AS-GA RATIOS [J].
BHATTACHARYA, PK ;
KU, JW ;
OWEN, SJT ;
AEBI, V ;
COOPER, CB ;
MOON, RL .
APPLIED PHYSICS LETTERS, 1980, 36 (04) :304-306
[2]   CONTINUOUS ROOM-TEMPERATURE OPERATION OF GA(1-X)ALXAS-GAAS DOUBLE-HETEROSTRUCTURE LASERS GROWN BY ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION [J].
DUPUIS, RD ;
DAPKUS, PD .
APPLIED PHYSICS LETTERS, 1978, 32 (07) :406-407
[3]  
IKOMA T, 1981, JAPAN J APPL PHYS, V20
[4]  
ITOH T, 1979, I PHYS C SER, V45, P326
[5]   STUDY OF ELECTRON TRAPS IN N-GAAS GROWN BY MOLECULAR-BEAM EPITAXY [J].
LANG, DV ;
CHO, AY ;
GOSSARD, AC ;
ILEGEMS, M ;
WIEGMANN, W .
JOURNAL OF APPLIED PHYSICS, 1976, 47 (06) :2558-2564
[6]   DEEP-LEVEL TRANSIENT SPECTROSCOPY - NEW METHOD TO CHARACTERIZE TRAPS IN SEMICONDUCTORS [J].
LANG, DV .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (07) :3023-3032
[7]   USE OF METAL-ORGANICS IN PREPARATION OF SEMICONDUCTOR MATERIALS .I. EPITAXIAL GALLIUM-V COMPOUNDS [J].
MANASEVIT, HM ;
SIMPSON, WI .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (12) :1725-+
[8]   ELECTRON TRAPS IN BULK AND EPITAXIAL GAAS CRYSTALS [J].
MARTIN, GM ;
MITONNEAU, A ;
MIRCEA, A .
ELECTRONICS LETTERS, 1977, 13 (07) :191-193
[9]   HOLE TRAPS IN BULK AND EPITAXIAL GAAS CRYSTALS [J].
MITONNEAU, A ;
MARTIN, GM ;
MIRCEA, A .
ELECTRONICS LETTERS, 1977, 13 (22) :666-668
[10]   GROWTH OF HIGH-PURITY GAAS EPILAYERS BY MOCVD AND THEIR APPLICATIONS TO MICROWAVE MESFETS [J].
NAKANISI, T ;
UDAGAWA, T ;
TANAKA, A ;
KAMEI, K .
JOURNAL OF CRYSTAL GROWTH, 1981, 55 (01) :255-262