OPTICAL RESPONSE IN PHOTOSELECTIVE METAL DEPOSITION (PSMD) IMAGING SYSTEM

被引：19

作者：

DAMICO, JF

LITT, FA

DEANGELO, MA

机构：

来源：

关键词：

D O I：

10.1149/1.2404376

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：956 / &

共 17 条

[1]

BENSON SW, 1960, F CHEM KINETICS, pCH3

[2] MOSSBAUER STUDY OF TIN(II) SENSITIZER DEPOSITS ON KAPTON [J].

COHEN, RL ;

DAMICO, JF ;

WEST, KW .

[3]

COHEN RL, 1971, OCT M SOC CLEV

[4]

DAMICO JF, UNPUBLISHED RESEARCH

[5]

DAMICO JF, 1970, J ECECTROCHEM SOC, V118, P1695

[6]

DEANGELO MA, 1971, Patent No. 3562005

[7]

HENDRICKSON JF, UNPUBLISHED RESEARCH

[8]

KITTEL C, 1956, INTRO SOLID STATE PH, P515

[9]

MEES CEK, 1966, THEORY PHOTOGRAPHIC, pCH4

[10]

ROSE A, 1963, CONCEPTS PHOTOCONDUC, P38