METHOD FOR DOPING THIN INSULATING FILMS AND COMPARISON BETWEEN ELECTRICAL CHARACTERISTICS OF UNDOPED AND DOPED FILMS

被引：10

作者：

ANTULA, J

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1971年 / 42卷 / 05期

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D O I：

10.1063/1.1660491

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：2081 / &

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