A HIGHEST RATE SELF-SPUTTERING MAGNETRON SOURCE

被引：47

作者：

KUKLA, R

KRUG, T

LUDWIG, R

WILMES, K

机构：

[1] Leybold AG

来源：

VACUUM | 1990年 / 41卷 / 7-9期

关键词：

D O I：

10.1016/0042-207X(90)94147-I

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

By switching from pure magnetic plasma confinement to a mixture of magnetic plus electrostatic plasma confinement, a new sputter mangetron source has been developed which combines the advantages of sputter deposition (good adherence and structure) with the productivity of e-gun evaporators (deposition rates of some thousand angstrom per second). At power densities above 80 W cm-2 the discharge keeps burning even without a noble gas atmosphere (self-sputtering).

引用

页码：1968 / 1970

页数：3