TUNNELING SPECTROSCOPY OF THE (110)-SURFACE OF DIRECT-GAP III-V SEMICONDUCTORS

被引:389
作者
FEENSTRA, RM
机构
[1] IBM Thomas J. Watson Research Center, Yorktown Heights, NY 10598
来源
PHYSICAL REVIEW B | 1994年 / 50卷 / 07期
关键词
D O I
10.1103/PhysRevB.50.4561
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Results of tunneling spectroscopy measurements of the (110) cleaved surface of GaAs, InP, GaSb, InAs, and InSb are presented. These materials form the family of direct-gap III-V binary semiconductors. Spectroscopic measurements are performed in ultrahigh vacuum, using a scanning tunneling microscope (STM). Techniques based on variable tip-sample separation are used to obtain high dynamic range (six orders of magnitude) in the measured current and conductance. Detailed spectra are obtained for all the materials, revealing the conduction- and valence-band edges, onset of the higher lying conduction band at the L point in the Brillouin zone, and various features associated with surface states. The precision and accuracy in determining energetic locations of spectral features are discussed. In particular, limitations in the accuracy due to tip-induced band bending is considered.
引用
收藏
页码:4561 / 4570
页数:10
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