POLYIMIDE OPTICAL WAVE-GUIDES FABRICATED WITH ELECTRON-BEAM LITHOGRAPHY

被引:12
作者
ROOKS, MJ [1 ]
ROUSSELL, HV [1 ]
JOHNSON, LM [1 ]
机构
[1] MIT,LINCOLN LAB,LEXINGTON,MA 02173
来源
APPLIED OPTICS | 1990年 / 29卷 / 27期
关键词
D O I
10.1364/AO.29.003880
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Fabrication ofPMMA clad polyimide waveguides by electron beam lithography creates very smooth sidewalls allowing production of narrow low loss waveguides on planar substrates. © 1990 Optical Society of America.
引用
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页码:3880 / 3882
页数:3
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