DIRECT ETCHING OF RESISTS BY UV-LIGHT

被引：20

作者：

UENO, N

KONISHI, S

TANIMOTO, K

SUGITA, K

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1981年 / 20卷 / 10期

关键词：

D O I：

10.1143/JJAP.20.L709

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L709 / L712

页数：4

共 13 条

[1]

ASANO T, 1977, P SPSE S PHOTO ELECT, P27

[2]

BOLON DA, 1970, 1970 P TECH C PHOT P, P129

[3] ELECTRON-IRRADIATION OF POLY(OLEFIN SULFONES) - APPLICATION TO ELECTRON-BEAM RESISTS [J].

BOWDEN, MJ ;

THOMPSON, LF .

JOURNAL OF APPLIED POLYMER SCIENCE, 1973, 17 (10) :3211-3221

[4]

HUGHES HG, 1979, 1979 P TECH C PHOT P, P206

[5] DRY DEVELOPMENT OF RESISTS EXPOSED TO FOCUSED GALLIUM ION-BEAM [J].

KUWANO, H ;

YOSHIDA, K ;

YAMAZAKI, SI .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (10) :L615-L617

[6] INTERACTION OF 5 KEV ELECTRONS WITH POLYMERS OF METHYL ISOPROPENYL KETONE [J].

LEVINE, AW ;

KAPLAN, M ;

POLINIAK, ES .

POLYMER ENGINEERING AND SCIENCE, 1974, 14 (07) :518-524

[7]

Nakane H., 1981, Oyo Buturi, V50, P145

[8] FORECAST OF VLSI PROCESSING - HISTORICAL REVIEW OF THE 1ST DRY-PROCESSED IC [J].

PENN, TC .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) :640-643

[9] PLASMA-DEVELOPED X-RAY RESISTS [J].

TAYLOR, GN ;

WOLF, TM .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (12) :2665-2674

[10] NEW FAMILY OF POSITIVE ELECTRON-BEAM RESISTS-POLY(OLEFIN SULFONES) [J].

THOMPSON, LF ;

BOWDEN, MJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (12) :1722-1726

← 1 2 →