PHOTO-VOLTAGE AND STABILITY OF AN N-TYPE SILICON SEMICONDUCTOR COATED WITH METAL OR METAL-FREE PHTHALOCYANINE THIN-FILMS IN AQUEOUS REDOX SOLUTIONS

被引：38

作者：

NAKATO, Y

SHIOJI, M

TSUBOMURA, H

机构：

来源：

JOURNAL OF PHYSICAL CHEMISTRY | 1981年 / 85卷 / 12期

关键词：

D O I：

10.1021/j150612a014

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

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页码：1670 / 1672

页数：3

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