SURFACE EFFECT AS A LIMITATION ON THE PERFORMANCE OF POLYCRYSTALLINE SI THIN-FILM TRANSISTORS

被引：6

作者：

KUNG, KTY

REIF, R

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 63卷 / 06期

关键词：

D O I：

10.1063/1.341068

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2131 / 2135

页数：5

共 20 条

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[10] POLYCRYSTALLINE SI THIN-FILM TRANSISTORS FABRICATED AT LESS-THAN-OR-EQUAL-TO-800-DEGREES-C - EFFECTS OF GRAIN-SIZE AND (110) FIBER TEXTURE [J].

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