PREPARATION OF CONTIGUOUS CHEMISORBED ADLAYERS BY SEQUENTIAL DEPOSITION AND SURFACE MIGRATION

被引:1
作者
KLEIN, R
机构
关键词
D O I
10.1016/0039-6028(72)90089-1
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:309 / &
相关论文
共 4 条
[1]   ADSORPTION AND DIFFUSION OF OXYGEN ON TUNGSTEN [J].
GOMER, R ;
HULM, JK .
JOURNAL OF CHEMICAL PHYSICS, 1957, 27 (06) :1363-1376
[2]   MOBILITY AND ADSORPTION OF HYDROGEN ON TUNGSTEN [J].
GOMER, R ;
WORTMAN, R ;
LUNDY, R .
JOURNAL OF CHEMICAL PHYSICS, 1957, 26 (05) :1147-1164
[3]   ADSORPTION, DIFFUSION, AND EVAPORATION OF CARBON MONOXIDE ON TUNGSTEN [J].
KLEIN, R .
JOURNAL OF CHEMICAL PHYSICS, 1959, 31 (05) :1306-1313
[4]   DEPOSITION OF HYDROGEN BEAMS ON TUNGSTEN [J].
KLEIN, R .
SURFACE SCIENCE, 1968, 11 (02) :227-&