SOME CALCULATIONS OF THICKNESS DISTRIBUTION OF FILMS DEPOSITED FROM LARGE AREA SPUTTERING SOURCES

被引:30
作者
GNAEDINGER, RJ
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1969年 / 6卷 / 03期
关键词
D O I
10.1116/1.1492693
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:355 / +
页数:1
相关论文
共 12 条
[1]  
Foote P, 1915, B STD, V12, P583
[2]  
GNAEDINGER RJ, 1959, 5 T S VAC TECHN, P235
[3]  
HOLLAND L, 1966, VACUUM DEPOSITION TH, P533
[4]  
HOLLAND L, 1966, VACUUM DEPOSITION TH, P141
[5]  
Knudsen M., 1909, ANN PHYS, V333, P999, DOI DOI 10.1002/ANDP.19093330505
[6]  
LOZGACHEV VI, 1963, SOV PHYS-TECH PHYS, V7, P736
[7]  
Maissel L. I., 1966, PHYS THIN FILMS, V3, P61
[8]  
PETIT G, 1961, TABLES INDEFINITE IN, P69
[9]  
PETIT G, 1961, TABLES INDEFINITE IN, P123
[10]  
Walsh JWT, 1920, P PHYS SOC LOND, V32, P59