COLLISIONAL ELECTRON DETACHMENT AND DECOMPOSITION CROSS-SECTIONS FOR SF6-, SF5-, AND F- ON SF6 AND RARE-GAS TARGETS

被引：35

作者：

WANG, YC ^{[1
]}

CHAMPION, RL ^{[1
]}

DOVERSPIKE, LD ^{[1
]}

OLTHOFF, JK ^{[1
]}

VANBRUNT, RJ ^{[1
]}

机构：

[1] NATL INST STAND & TECHNOL,GAITHERSBURG,MD 20899

来源：

JOURNAL OF CHEMICAL PHYSICS | 1989年 / 91卷 / 04期

关键词：

D O I：

10.1063/1.457033

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：2254 / 2260

页数：7

共 22 条

[11] DIELECTRIC-PROPERTIES FOR SF6 AND SF6 MIXTURES PREDICTED FROM BASIC DATA [J].

KLINE, LE ;

DAVIES, DK ;

CHEN, CL ;

CHANTRY, PJ .

JOURNAL OF APPLIED PHYSICS, 1979, 50 (11) :6789-6796

[12] RATE CONSTANTS FOR UNIMOLECULAR DECOMPOSITION AT THRESHOLD [J].

KLOTS, CE .

CHEMICAL PHYSICS LETTERS, 1976, 38 (01) :61-64

[13] REFORMULATION OF QUASIEQUILIBRIUM THEORY OF IONIC FRAGMENTATION [J].

KLOTS, CE .

JOURNAL OF PHYSICAL CHEMISTRY, 1971, 75 (10) :1526-&

[14] STUDY OF ELECTRON ATTACHMENT OF SF6 AND AUTO-DETACHMENT AND STABILIZATION OF SF-6 [J].

ODOM, RW ;

SMITH, DL ;

FUTRELL, JH .

JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS, 1975, 8 (08) :1349-1366

[15] COLLISIONAL ELECTRON DETACHMENT AND DECOMPOSITION RATES OF SF6-, SF5-, AND F- IN SF6 - IMPLICATIONS FOR ION-TRANSPORT AND ELECTRICAL DISCHARGES [J].

OLTHOFF, JK ;

VANBRUNT, RJ ;

WANG, YC ;

CHAMPION, RL ;

DOVERSPIKE, LD .

JOURNAL OF CHEMICAL PHYSICS, 1989, 91 (04) :2261-2268

[16] COLLISIONAL DETACHMENT OF ELECTRONS IN SULFUR HEXAFLUORIDE [J].

ONEILL, BC ;

CRAGGS, JD .

JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS, 1973, 6 (12) :2634-2640

[17] COMPARISON OF CALCULATED AND EXPERIMENTAL THERMAL ATTACHMENT RATE CONSTANTS FOR SF6 IN THE TEMPERATURE-RANGE 200-600-K [J].

ORIENT, OJ ;

CHUTJIAN, A .

PHYSICAL REVIEW A, 1986, 34 (03) :1841-1846

[18] ELECTRON-TRANSPORT, IONIZATION, ATTACHMENT, AND DISSOCIATION COEFFICIENTS IN SF6 AND ITS MIXTURES [J].

PHELPS, AV ;

VANBRUNT, RJ .

JOURNAL OF APPLIED PHYSICS, 1988, 64 (09) :4269-4277

[19]

SCHLUMBOHM J, 1962, Z PHYS, V166, P192

[20] WATER VAPOR-ENHANCED ELECTRON-AVALANCHE GROWTH IN SF6 FOR NONUNIFORM FIELDS [J].

VANBRUNT, RJ .

JOURNAL OF APPLIED PHYSICS, 1986, 59 (07) :2314-2323

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