RECA-INDEPENDENT RESISTANCE TO IRRADIATION WITH UV-LIGHT IN ACID-HABITUATED ESCHERICHIA-COLI

被引:20
作者
GOODSON, M
ROWBURY, RJ
机构
[1] Department of Biology, University College, London
来源
JOURNAL OF APPLIED BACTERIOLOGY | 1991年 / 70卷 / 02期
关键词
D O I
10.1111/j.1365-2672.1991.tb04445.x
中图分类号
Q81 [生物工程学(生物技术)]; Q93 [微生物学];
学科分类号
071005 ; 0836 ; 090102 ; 100705 ;
摘要
Growth of Escherichia coli 1829 ColV, I-K94 at pH 5.0 led to an increase in u.v. resistance compared with cells grown at pH 7.0. This was due to a phenotypic change, since organisms grown at pH 7.0 showed increased resistance after only 2.5-5.0 min incubation at the mildly acid pH. Other E. coli K12 derivatives became more u.v.-resistant at pH 5.0 including uvrA, recA and polAl mutants. Organisms grown at pH 5.0 also showed increased Weigle reactivation of u.v.-irradiated lambda phage and this applied to the repair-deficient mutants as well as the parent strains. Both the increased u.v. resistance of acid-habituated cells and their increased ability to bring about Weigle reactivation appear to involve RecA-independent processes and are presumably, therefore, independent of the SOS response.
引用
收藏
页码:177 / 180
页数:4
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