RANGES AND VARIANCES OF 0.2-1.0 KEV HYDROGEN AND DEUTERIUM IONS IMPLANTED INTO BE, C AND SI

被引:27
作者
LEBLANC, L
ROSS, GG
机构
[1] INRS-Énergie et Matériaux, Université du Québec, Varennes, Que. J3X 1S2
关键词
D O I
10.1016/0168-583X(93)95901-G
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The ion beam analysis technique of elastic recoil detection with an electromagnetic filter has been used to measure the mean ranges and variances of 0.2-1.0 keV H and D ions implanted in Be, C and Si. Two corresponding Monte Carlo (BABOUM and TRIM) code calculations have also been performed and compared. Other theoretical and experimental results are included. Power law fits as a function of energy, R(p) = R0E(n), have been adjusted to the ranges and a general function is deduced which allows a rapid estimation of the mean ranges.
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页码:15 / 20
页数:6
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