PREPARATION AND OPTICAL NONLINEAR PROPERTY OF SOL-GEL-DERIVED CU-SIO2 THIN-FILMS

被引：36

作者：

KUNDU, D ^{[1
]}

HONMA, I ^{[1
]}

OSAWA, T ^{[1
]}

KOMIYAMA, H ^{[1
]}

机构：

[1] UNIV TOKYO, DEPT CHEM ENGN, TOKYO 113, JAPAN

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1994年 / 77卷 / 04期

关键词：

D O I：

10.1111/j.1151-2916.1994.tb07282.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Cu-metal-doped glass films having a Cu:Si atomic ratio of 0.05 +/- 0.002 were successfully prepared by a sol-gel method using a dipping technique. The appearance of surface plasmon of Cu metal at about 570 nm was observed after heat treatment at or above 700-degrees-C. The third-order nonlinear susceptibility (chi3) was as high as 5.0 x 10(-8) esu at 570 nm.

引用

页码：1110 / 1112

页数：3

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