RETARDATION OF SB DIFFUSION IN SI DURING THERMAL-OXIDATION

被引：118

作者：

MIZUO, S

HIGUCHI, H

机构：

来源：

关键词：

D O I：

10.1143/JJAP.20.739

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：739 / 744

页数：6

共 9 条

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