COMPUTER-SIMULATION OF SINGLE-CRYSTAL AND POLYCRYSTAL SPUTTERING .1.

被引：64

作者：

SHULGA, VI

机构：

来源：

RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1983年 / 70卷 / 1-4期

关键词：

D O I：

10.1080/00337578308219206

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

Sputtering of Cu single-crystal and polycrystal targets by 27 keV Ar ions has been simulated using the new binary collision cascade computer program OKSANA. The sputtering yield, the sputtering and reflection efficiencies, and the absolute and relative contributions to sputtering from various components have been calculated in a broad range of incidence angles. The obtained angular dependences of the sputtering yield have proved to agree with experimental data.

引用

页码：65 / 83

页数：19

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