ULTRATHIN METAL-FILMS ON W(111) - MORPHOLOGY AND FACETING RECONSTRUCTION

被引:74
作者
GUAN, J
CAMPBELL, RA
MADEY, TE
机构
[1] RUTGERS STATE UNIV, DEPT CHEM, PISCATAWAY, NJ 08855 USA
[2] RUTGERS STATE UNIV, SURFACE MODIFICAT LAB, PISCATAWAY, NJ 08855 USA
[3] RUTGERS STATE UNIV, DEPT PHYS & ASTRON, PISCATAWAY, NJ 08855 USA
关键词
FACETING; IRIDIUM; LOW ENERGY ELECTRON DIFFRACTION (LEED); LOW INDEX SINGLE CRYSTAL SURFACES; METALLIC FILMS; METAL-METAL INTERFACES; RHODIUM; THERMAL DESORPTION SPECTROSCOPY; TUNGSTEN;
D O I
10.1016/0039-6028(95)00741-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The structure and morphology of Rh, Ir, Ti, Co, Ni, Cu, Ag and Gd ultrathin films on W(111) have been investigated by means of Auger electron spectroscopy (AES), low energy electron diffraction (LEED) and temperature programmed desorption (TPD). Upon annealing to > 700 K, Rh and Ir overlayers with a critical coverage of at least one physical monolayer, as well as chemisorbed S, induce reconstruction of the W(111) substrate to form pyramidal facets with {211} orientation. In contrast, for overlayers of Ti, Co, Ni, Cu, Ag and Gd on W(111), no evidence for metal film induced faceting of the substrate has been observed for any coverage or annealing temperature. A comprehensive analysis of the physical, chemical and electronic properties of both metal and non-metal overlayers strongly suggests that the electronic structure plays a dominant role in causing surface instability of W(111).
引用
收藏
页码:311 / 327
页数:17
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