EFFECT OF TEMPERATURE ON THE ATTACHMENT OF SLOW (LESS-THAN-OR-EQUAL-TO-1 EV) ELECTRONS TO CH3BR

被引:38
作者
DATSKOS, PG [1 ]
CHRISTOPHOROU, LG [1 ]
CARTER, JG [1 ]
机构
[1] UNIV TENNESSEE,DEPT PHYS,KNOXVILLE,TN 37996
关键词
D O I
10.1063/1.463329
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The electron attachment rate constant k(a)([is-an-element-of], T) for CH3Br has been measured in a buffer gas of N2 using a high pressure electron swarm apparatus, within the mean electron energy range from thermal (approximately 0.046 eV) to 0.87 eV and over the temperature range, T, 300-700 K. At room temperature, CH3Br attaches low energy electrons weakly but as T is raised from 300 to 700 K the total electron attachment cross section increases by more than 2 orders of magnitude. At T=300 K the electron attachment cross section exhibits a peak at 0.38 eV which shifts progressively to lower electron energies as Tis increased. The thermal value of k(a) is 1.08 X 10(-11) cm3 s-1 at 300 K and 3.2 8 X 10(-9) cm3 s-1 at 700 K.
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页码:9031 / 9035
页数:5
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