XPS STUDY OF POLYIMIDE H-FILM AFTER HEAT-TREATMENT AND LASER PROCESSING

被引：8

作者：

NAGARKAR, PV ^{[1
]}

SICHEL, EK ^{[1
]}

机构：

[1] MIT,DEPT ELECT ENGN & COMP SCI,CAMBRIDGE,MA 02139

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 10期

关键词：

D O I：

10.1149/1.2096386

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2979 / 2982

页数：4

共 14 条

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[5]

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[7] AN XPS STUDY OF THE COMPOSITION OF THIN POLYIMIDE FILMS FORMED BY VAPOR-DEPOSITION [J].

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UNERTL, WN .

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[8]

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[9]

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[10]

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