MAGNETICS OF NIFE AND TI COMPOSITES - EFFECT OF ANNEALING

被引:5
作者
NARAYAN, PB
SILKENSEN, RD
BRYANT, S
BRYANT, S
DEY, S
机构
[1] Louisville, CO, 80028–8193., StorageTek
关键词
D O I
10.1109/20.179677
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The magnetic properties, retained stress, microstructure and compositional profiles of Ti/NiFe thin film composites were studied as a function of annealing temperature up to 300 C. Annealing at 300 C caused coarsening of microstructure, NiFe compositional changes and an increase in the retained tensile stress, leading to increases in H(ce), H(ch), H(k) and lambda(s) values. The processing temperature limit for this composite is less than 300 C.
引用
收藏
页码:2934 / 2936
页数:3
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