LOW-PRESSURE CVD OF III-V COMPOUNDS

被引:13
作者
DUCHEMIN, JP
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 18卷 / 03期
关键词
D O I
10.1116/1.570941
中图分类号
O59 [应用物理学];
学科分类号
摘要
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页码:753 / 755
页数:3
相关论文
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[5]   GROWTH OF GA0.47IN0.53AS ON INP BY LOW-PRESSURE MO CVD [J].
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ELECTRONICS LETTERS, 1980, 16 (11) :415-416
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HIRTZ JP, UNPUBLISHED
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