ENERGY RELAXATION OF WARM CARRIERS IN GERMANIUM AND SILICON

被引:38
作者
HESS, K
SEEGER, K
机构
[1] Ludwig Boltzmann-Institut für Festkörperphysik, Wien
[2] E.E. Dept. Texas Tech. College, Lubbock, 79409, Texas
来源
ZEITSCHRIFT FUR PHYSIK | 1969年 / 218卷 / 05期
关键词
D O I
10.1007/BF01392422
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Experimental data on warm carrier energy relaxation times in germanium and silicon are reported. Measurements were done by the method of harmonic mixing of microwaves 1 in the temperature range between 77 and 200 °K. Relaxation times obtained for n-type germanium are in agreement with data reported by Morgan 2 as well as that of Seeger 3 and Gibsonet al. 4. Measured energy relaxation times for p-type germanium as well as for n- and p-type silicon are reported here for the first time. A qualitative interpretation is given in terms of scattering by acoustic and optical phonons. © 1969 Springer-Verlag.
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页码:431 / &
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