INSITU RADIOCHEMICAL CHARACTERIZATION OF ADSORBATES AT SMOOTH ELECTRODE SURFACES

被引：43

作者：

KRAUSKOPF, EK ^{[1
]}

CHAN, K ^{[1
]}

WIECKOWSKI, A ^{[1
]}

机构：

[1] UNIV ILLINOIS,DEPT CHEM,URBANA,IL 61801

来源：

JOURNAL OF PHYSICAL CHEMISTRY | 1987年 / 91卷 / 09期

关键词：

D O I：

10.1021/j100293a024

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：2327 / 2332

页数：6

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