STUDY OF BIAS-DEPENDENT ETCHING OF SI IN AQUEOUS KOH

被引：62

作者：

PALIK, ED

GLEMBOCKI, OJ

HEARD, I

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 02期

关键词：

D O I：

10.1149/1.2100468

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：404 / 409

页数：6

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