SUBSTRATE CURRENT IN SILICON P-CHANNEL MOS TRANSISTORS

被引:7
作者
RYAN, RD
机构
[1] Instrumentation and Control Div., Australian Atomic Energy Commission, Sutherland, N.S.W.
关键词
D O I
10.1109/PROC.1969.7282
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Substrate currents are observed in silicon p-channel MOSFET devices. These currents are similar to those observed in n-channel MOSFETs but have a markedly higher threshold voltage. Copyright © 1969 by The Institute of Electrical and Electronics Engineers, Inc.
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页码:1424 / &
相关论文
共 2 条
[1]   ANOMALOUS ENHANCEMENT OF SUBSTRATE TERMINAL CURRENT BEYOND PINCH-OFF IN SILICON N-CHANNEL MOS TRANSISTORS AND ITS RELATED PHENOMENA [J].
NAKAHARA, M ;
IWASAWA, H ;
YASUTAKE, K .
PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1968, 56 (11) :2088-&
[2]   GATE CURRENTS OF JUNCTION FIELD-EFFECT TRANSISTORS AT LOW TEMPERATURES [J].
RYAN, RD .
PROCEEDINGS OF THE IEEE, 1969, 57 (06) :1225-+