INTERFACE KINETICS AND VAPOR-PHASE MASS-TRANSPORT IN HORIZONTAL CLOSED TUBE CVD SYSTEMS

被引：3

作者：

PAORICI, C ^{[1
]}

ATTOLINI, G ^{[1
]}

机构：

[1] IST FIS,PARMA,ITALY

来源：

MATERIALS CHEMISTRY | 1979年 / 4卷 / 03期

关键词：

D O I：

10.1016/0390-6035(79)90023-3

中图分类号：

O69 [应用化学];

学科分类号：

081704 ;

摘要：

Interrelations between interface and vapour-transport in crystal-growth chemical vapour deposition are discussed for closed-tube horizontal arrangements, with particular reference to the role of mass free convection. A criterium is given for defining the kinetic state of a growth process, which is based on the fact that the fluid-dynamic kinetic component depends upon the closed-tube geometry while the interface kinetic component does not depend upon it. This criterium is applied for the statement of the kinetic state of the CdS:I2 system at constant temperature profile. © 1979.

引用

页码：301 / 307

页数：7

共 13 条

[1] TRANSPORT REACTION IN CLOSED TUBE PROCESS [J].