INTERFACE KINETICS AND VAPOR-PHASE MASS-TRANSPORT IN HORIZONTAL CLOSED TUBE CVD SYSTEMS

被引:3
作者
PAORICI, C [1 ]
ATTOLINI, G [1 ]
机构
[1] IST FIS,PARMA,ITALY
来源
MATERIALS CHEMISTRY | 1979年 / 4卷 / 03期
关键词
D O I
10.1016/0390-6035(79)90023-3
中图分类号
O69 [应用化学];
学科分类号
081704 ;
摘要
Interrelations between interface and vapour-transport in crystal-growth chemical vapour deposition are discussed for closed-tube horizontal arrangements, with particular reference to the role of mass free convection. A criterium is given for defining the kinetic state of a growth process, which is based on the fact that the fluid-dynamic kinetic component depends upon the closed-tube geometry while the interface kinetic component does not depend upon it. This criterium is applied for the statement of the kinetic state of the CdS:I2 system at constant temperature profile. © 1979.
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页码:301 / 307
页数:7
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