ORIGIN OF BORON CONTAMINATION OF THE INTRINSIC AMORPHOUS-SILICON HYDROGEN ALLOYS IN GLOW-DISCHARGE SYSTEM

被引：3

作者：

TSAI, HK

TZENG, WJ

LEE, SC

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 10期

关键词：

D O I：

10.1149/1.2096393

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：3011 / 3016

页数：6

共 15 条

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