EFFECT OF FRUSTRATION ON THE BAND EDGE IN AMORPHOUS-SEMICONDUCTORS

被引:8
作者
BLACKMAN, JA [1 ]
THORPE, MF [1 ]
机构
[1] MICHIGAN STATE UNIV,DEPT PHYS,E LANSING,MI 48824
来源
PHYSICAL REVIEW B | 1981年 / 23卷 / 06期
关键词
D O I
10.1103/PhysRevB.23.2871
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:2871 / 2875
页数:5
相关论文
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