AN INORGANIC RESIST FOR ION-BEAM MICROFABRICATION

被引：22

作者：

BALASUBRAMANYAM, K

KARAPIPERIS, L

LEE, CA

RUOFF, AL

机构：

[1] CORNELL UNIV,DEPT PHYS,ITHACA,NY 14853

[2] CORNELL UNIV,NATL RES & RESOURCE FACIL SUBMICRON STRUCT,ITHACA,NY 14853

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 01期

关键词：

D O I：

10.1116/1.571008

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：18 / 22

页数：5

共 21 条

[1]

AGARWAL SC, 1975, PHYS REV B, V10, P4351

[2]

[Anonymous], 1977, STOPPING RANGES IONS

[3]

BALASUBRAMANYAM K, UNPUBLISHED

[4]

BALASUBRAMANYAM K, 1980, B AM PHYS SOC, V25, P1979

[5]

BOHLEN H, 1978, 8TH P INT C EL ION B, P420

[6] DRY-ETCHED INORGANIC RESIST [J].

CHANG, MS ;

CHEN, JT .

APPLIED PHYSICS LETTERS, 1978, 33 (10) :892-895

[7] DIFFRACTION EFFICIENCY OF CONTINUOUSLY ETCHED GRATINGS IN AS2S3 FILMS [J].

CHANG, MS ;

HOU, TW .

OPTICS COMMUNICATIONS, 1978, 24 (02) :220-224

[8]

Chopra K. L., COMMUNICATION

[9]

DENEUFVILLE JP, 1975, OPTICAL PROPERTIES S, P459

[10] COLUMNAR MICROSTRUCTURE IN VAPOR-DEPOSITED THIN-FILMS [J].

DIRKS, AG ;

LEAMY, HJ .

THIN SOLID FILMS, 1977, 47 (03) :219-233

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