THE STRUCTURE OF ALUMINUM FILMS DEPOSITED BY PARTIALLY IONIZED BEAM

[1] KONONENKO OV, 1990, MIKROELEKTRONIKA, V19, P139

[2] KOPEZKII CV, 1987, GRAIN BOUNDARIES HIG

[3] ELECTROMIGRATION IN AL/SIO2 FILMS PREPARED BY A PARTIALLY IONIZED BEAM DEPOSITION TECHNIQUE [J]. APPLIED PHYSICS LETTERS, 1989, 54 (24) : 2443 - 2445

[4] DIFFUSION IN MIGRATING INTERFACES [J]. ACTA METALLURGICA, 1978, 26 (12): : 1833 - 1836

[5] Smith D A, 1988, MATER RES SOC S P, V122, P3

[6] LINEWIDTH DEPENDENCE OF ELECTROMIGRATION IN EVAPORATED AL-0.5-PERCENT CU [J]. APPLIED PHYSICS LETTERS, 1980, 36 (06) : 464 - 466

[7] EFFECT OF TEXTURE AND GRAIN-STRUCTURE ON ELECTROMIGRATION IN AL-0.5-PERCENT CU THIN-FILMS [J]. THIN SOLID FILMS, 1981, 75 (03) : 253 - 259

[8] NON-EQUILIBRIUM STATE AND RECOVERY OF GRAIN-BOUNDARY STRUCTURE .2. ENERGETIC ANALYSIS [J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1983, 78 (01): : 177 - 186

[9] METALLIZATION BY IONIZED CLUSTER BEAM DEPOSITION [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1987, 34 (05) : 1018 - 1025

[10] EFFECT OF ELEMENTAL PLASMA ON METAL-SI FILMS BY PARTIALLY IONIZED BEAM DEPOSITION [J]. JOURNAL OF ELECTRONIC MATERIALS, 1991, 20 (07) : 577 - 581

[1] KONONENKO OV, 1990, MIKROELEKTRONIKA, V19, P139

[2] KOPEZKII CV, 1987, GRAIN BOUNDARIES HIG

[3] ELECTROMIGRATION IN AL/SIO2 FILMS PREPARED BY A PARTIALLY IONIZED BEAM DEPOSITION TECHNIQUE [J]. APPLIED PHYSICS LETTERS, 1989, 54 (24) : 2443 - 2445

[4] DIFFUSION IN MIGRATING INTERFACES [J]. ACTA METALLURGICA, 1978, 26 (12): : 1833 - 1836

[5] Smith D A, 1988, MATER RES SOC S P, V122, P3

[6] LINEWIDTH DEPENDENCE OF ELECTROMIGRATION IN EVAPORATED AL-0.5-PERCENT CU [J]. APPLIED PHYSICS LETTERS, 1980, 36 (06) : 464 - 466

[7] EFFECT OF TEXTURE AND GRAIN-STRUCTURE ON ELECTROMIGRATION IN AL-0.5-PERCENT CU THIN-FILMS [J]. THIN SOLID FILMS, 1981, 75 (03) : 253 - 259

[8] NON-EQUILIBRIUM STATE AND RECOVERY OF GRAIN-BOUNDARY STRUCTURE .2. ENERGETIC ANALYSIS [J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1983, 78 (01): : 177 - 186

[9] METALLIZATION BY IONIZED CLUSTER BEAM DEPOSITION [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1987, 34 (05) : 1018 - 1025

[10] EFFECT OF ELEMENTAL PLASMA ON METAL-SI FILMS BY PARTIALLY IONIZED BEAM DEPOSITION [J]. JOURNAL OF ELECTRONIC MATERIALS, 1991, 20 (07) : 577 - 581