NON-OHMIC CONDUCTION IN MOS SYSTEMS WITH THIN OXIDE LAYERS

被引：3

作者：

FORGACS, G ^{[1
]}

LORINCZY, A ^{[1
]}

NEMETHSA.M ^{[1
]}

机构：

[1] HUNGARIAN ACAD SCI,RES INST TECH PHYS,BUDAPEST,HUNGARY

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1973年 / 20卷 / 02期

关键词：

D O I：

10.1002/pssa.2210200245

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：K113 / K117

页数：5

共 12 条

[1] ELECTRONIC CONDUCTION THROUGH EVAPORATED SILICON OXIDE FILMS [J].

ADACHI, H ;

SHIBATA, Y ;

ONO, S .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1971, 4 (07) :988-&

[2] TRAPPING IN GERMANIUM AND SILICON [J].

CURTIS, OL .

JOURNAL OF APPLIED PHYSICS, 1970, 41 (13) :5297-&

[3]

DORDA G, 1968, SURFACE SCI, V15, P14

[4]

Frenkel J, 1938, PHYS REV, V54, P647, DOI 10.1103/PhysRev.54.647

[5] POOLE-FRENKEL EFFECT [J].

HALL, RB .

THIN SOLID FILMS, 1971, 8 (04) :263-&

[6] ELECTRICAL CONDUCTION IN SILICON MONOXIDE FILMS [J].

HILL, AE ;

PHAHLE, AM ;

CALDERWOOD, JH .

THIN SOLID FILMS, 1970, 5 (5-6) :287-+

[7] POOLE-FRENKEL CONDUCTION IN AMORPHOUS SOLIDS [J].

HILL, RM .

PHILOSOPHICAL MAGAZINE, 1971, 23 (181) :59-&

[8] NON-OHMIC CONDUCTION IN VACUUM-DEPOSITED SIO FILMS [J].

HIROSE, H ;

WADA, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1965, 4 (09) :639-&

[9]

Jonscher A. K., 1967, THIN SOLID FILMS, V1, P213

[10]

PASSYNKOW WW, 1965, NICHTLINEARE HALBLEI

← 1 2 →