THE CHEMICAL VAPOR-DEPOSITION OF BORON AT LOW-TEMPERATURES

被引：26

作者：

PIERSON, HO

MULLENDORE, AW

机构：

来源：

THIN SOLID FILMS | 1981年 / 83卷 / 01期

关键词：

D O I：

10.1016/0040-6090(81)90590-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：87 / 91

页数：5

共 12 条

[1]

Adams R.M., 1964, BORON METALLO BORON

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BRAGANZA, C ;

VEPREK, S ;

GRONER, P .

JOURNAL OF NUCLEAR MATERIALS, 1979, 85-6 (DEC) :1133-1137

[3]

CAMBEL AB, 1963, PLASMA PHYSICS MAGNE

[4] BORIDING WITH A THERMALLY UNSTABLE GAS (DIBORANE) [J].

CASADESUS, P ;

FRANTZ, C ;

GANTOIS, M .

METALLURGICAL TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE, 1979, 10 (11) :1739-1743

[5]

DIBORANE, 1976, CCC TECH B

[6]

Holzmann R. T., 1967, PRODUCTION BORANES R

[7] LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION FOR VERY LARGE-SCALE INTEGRATION PROCESSING - REVIEW [J].

KERN, W ;

SCHNABLE, GL .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) :647-657

[8]

Matkovich VI, 1977, BORON REFRACTORY BOR

[9]

MATTOX DM, 1979, SAND790707C SAND NAT

[10] BORON COATINGS ON GRAPHITE FOR FUSION-REACTOR APPLICATIONS [J].

PIERSON, HO ;

MULLENDORE, AW .

THIN SOLID FILMS, 1979, 63 (02) :257-261

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