THE EFFECT OF NITROGEN-CONTENT ON THE CRITICAL NORMAL FORCE IN SCRATCH TESTING OF TI-N FILMS

被引:10
作者
VALLI, J [1 ]
MOLARIUS, JM [1 ]
KORHONEN, AS [1 ]
机构
[1] HELSINKI UNIV TECHNOL,DEPT MAT SCI & MIN,MET WORKING & HEAT TREATMENT LAB,SF-02150 ESPOO,FINLAND
关键词
D O I
10.1016/0040-6090(87)90378-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:351 / 360
页数:10
相关论文
共 26 条
[1]  
Ahn J., 1978, Adhesion Measurement of Thin Films, Thick Films and Bulk Coatings, P134, DOI 10.1520/STP38630S
[2]   RANGES OF SOME LIGHT-IONS MEASURED BY (P, GAMMA) RESONANCE BROADENING [J].
ANTTILA, A ;
BISTER, M ;
FONTELL, A ;
WINTERBON, KB .
RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1977, 33 (01) :13-19
[3]  
ASPLUND M, 1986, MATER RES SOC S P, V54, P541
[4]   ADHESION OF EVAPORATED METAL FILMS ON GLASS [J].
BENJAMIN, P ;
WEAVER, C .
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1961, 261 (1304) :516-+
[5]   MEASUREMENT OF ADHESION OF THIN FILMS [J].
BENJAMIN, P ;
WEAVER, C .
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1960, 254 (1277) :163-176
[6]  
Benjamin P., 1959, P ROY SOC LOND A MAT, V254A, P177
[7]   STYLUS OR SCRATCH METHOD FOR THIN FILM ADHESION MEASUREMENT - SOME OBSERVATIONS AND COMMENTS [J].
BUTLER, DW ;
STODDART, CT ;
STUART, PR .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1970, 3 (06) :877-&
[8]  
Goddard J., 1965, WEAR, V5, P114, DOI [10.1016/0043-1648(62)90235-1, DOI 10.1016/0043-1648(62)90235-1]
[9]   SOME FACTORS INFLUENCING THE ADHESION OF FILMS PRODUCED BY VACUUM EVAPORATION [J].
HEAVENS, OS .
JOURNAL DE PHYSIQUE ET LE RADIUM, 1950, 11 (07) :355-360
[10]  
HINTERMANN HE, 1983, 1983 P INT ION ENG C, P1115