LOW-TEMPERATURE RESISTIVITY AND THERMOELECTRIC RATIO OF COPPER AND GOLD

被引：52

作者：

KHOSHENEVISAN, M ^{[1
]}

PRATT, WP ^{[1
]}

SCHROEDER, PA ^{[1
]}

STEENWYK, SD ^{[1
]}

机构：

[1] MICHIGAN STATE UNIV, E LANSING, MI 48824 USA

来源：

PHYSICAL REVIEW B | 1979年 / 19卷 / 08期

关键词：

D O I：

10.1103/PhysRevB.19.3873

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：3873 / 3878

页数：6

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