490-NM-XEF ELECTRIC-DISCHARGE LASER

被引：38

作者：

FISHER, CH

CENTER, RE

MULLANEY, GJ

MCDANIEL, JP

机构：

[1] Mathematical Sciences Northwest, Incorporated, Bellevue

来源：

APPLIED PHYSICS LETTERS | 1979年 / 35卷 / 01期

关键词：

D O I：

10.1063/1.90919

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Lasing at 490 nm in the broadband XeF (C 3/2→A 3/2) transition has been achieved in He/Xe/NF3 gas mixtures excited by a uv preionized electric discharge. Measurements of the C→A laser spectrum show a bandwidth of approximately 40 nm centered around 490 nm, indicating that the laser should be tunable over a wide spectral region in the visible.

引用

页码：26 / 28

页数：3

共 8 条

[1]

BISCHEL WK, UNPUBLISHED

[2] TRANSFER AND QUENCHING RATE CONSTANTS FOR XEF(III,1/2) AND XEF(II,3/2) [J].