SURFACE-PROPERTIES OF FLUORINATED POLYIMIDES EXPOSED TO VUV AND ATOMIC OXYGEN

被引:30
作者
RASOUL, FA
HILL, DJT
FORSYTHE, JS
ODONNELL, JH
GEORGE, GA
POMERY, PJ
YOUNG, PR
CONNELL, JW
机构
[1] UNIV QUEENSLAND,POLYMER MAT & RADIAT GRP,ST LUCIA,QLD 4072,AUSTRALIA
[2] NASA,LANGLEY RES CTR,POLYMER MAT BRANCH,HAMPTON,VA 23665
关键词
D O I
10.1002/app.1995.070581024
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The effect of atomic oxygen flux and VUV radiation alone and in combination on the surface of fluorinated polyimide films was studied using XPS spectroscopy. Exposure of fluorinated polyimides to VUV radiation alone caused no observable damage to the polymer surface, while an atomic oxygen flux resulted in substantial oxidation of the surface. On the other hand, exposure to VUV radiation and atomic oxygen in combination caused extensive oxidation of the polymer surface after only 2 min of exposure. The amount of oxidized carbon on the polymer surface indicated that there is aromatic ring-opening oxidation. The changes in the O1s/C1s, N1s/C1s, and F1s/C1s ratios suggested that an ablative degradation process is highly favorable. A synergistic effect of VUV radiation in the presence of atomic oxygen is clearly evidenced from the XPS study. The atomic oxygen could be considered as the main factor in the degradation process of fluorinated polyimide films exposed to a low earth orbit environment. (C) 1995 John Wiley & Sons, Inc.
引用
收藏
页码:1857 / 1864
页数:8
相关论文
共 14 条
[1]  
Beamson G., 1992, HIGH RESOLUTION XPS, DOI 10.1021/ED070PA25.5
[2]  
FORSYTHE JS, 1993, 3RD LDEF S WILL
[3]   ELECTRON-PARAMAGNETIC RESONANCE INVESTIGATION OF FREE-RADICALS IN POLYIMIDE FILMS [J].
GEORGE, MA ;
RAMAKRISHNA, BL ;
GLAUNSINGER, WS .
JOURNAL OF PHYSICAL CHEMISTRY, 1990, 94 (12) :5159-5164
[4]   PHOTODEGRADATION OF POLYIMIDES .4. MECHANISM FOR THE PHOTOOXIDATION PROCESS BASED ON A MODEL-COMPOUND [J].
HOYLE, CE ;
CREED, D ;
NAGARAJAN, R ;
SUBRAMANIAN, P ;
ANZURES, ET .
POLYMER, 1992, 33 (15) :3162-3168
[5]   CONTROLLED MODIFICATION OF ORGANIC POLYMER SURFACES BY CONTINUOUS WAVE FAR-ULTRAVIOLET (185NM) AND PULSED-LASER (193NM) RADIATION - XPS STUDIES [J].
LAZARE, S ;
HOH, PD ;
BAKER, JM ;
SRINIVASAN, R .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1984, 106 (15) :4288-4290
[6]  
LEE M, 1993, NASA C PUBLICATION, V3194, P957
[7]  
MESHISHNEK MJ, 1988, NASA TM100459, V2
[8]  
MINTON TK, 1993, 3RD LDEF S WILL
[9]  
SLEMP WS, 1988, NASA TM100459, V1
[10]  
STCLAIR AK, 1984, P DIVISION POLYM MAT, V51, P62