THICKNESS FLUCTUATIONA AND ELECTRIC FIELD PENETRATION IN THIN METAL-INSULATOR-METAL STRUCTURES

被引：7

作者：

ANTULA, J

机构：

来源：

关键词：

D O I：

10.1016/0038-1101(68)90128-7

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1063 / &

共 9 条

ANTULA, J .

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[9] ELECTRIC FIELD PENETRATION INTO METALS [J].

MACDONALD, JR .