DEPENDENCE OF TIME OF BREAKDOWN ON ELECTRODE TEMPERATURES IN NITROGEN FILLED DIODES

被引:54
作者
BOSAN, DA
PEJOVIC, MM
机构
[1] Faculty of Electronic Engineering, PF73, 18001, NiS
关键词
D O I
10.1088/0022-3727/12/10/011
中图分类号
O59 [应用物理学];
学科分类号
摘要
Time delays of electrical breakdown in a gas-filled diode (td) were measured as a function of the time between two successive measurements ( tau ) at cathode temperatures of 300K, 523K and 673K. The diode was filled with nitrogen at 4 mbar with an oxygen impurity of about 10 ppm. It is shown that the breakdown time delays at 673K are one order of magnitude smaller than those at 300K.
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页码:1699 / 1702
页数:4
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